1200°C Tube Furnace with Internal Travel Mechanism For HPCVD
TMAX-1200X-S-HPCVD is a compact 2" split tube furnace with internal sample traveling system inside the processing tube. This allows the position & temperature control of the sample stage or crucible via touch screen digital controller. It is designed for multi-functional rapid thermal processing, such as hybrid physical-chemical deposition(HPCVD), rapid thermal evaporation (RTE), and as well Horizontal Bridgman Crystal Growth ( HDC) under various atmosphere for new generation crystal research.
SPECIFICATIONS:
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- 208 - 240 VAC, 50/60Hz, 1.2 KW max. power consumption
- Working temperature: 1100°C continuous and 1200°C Max.
- 2" quartz tube (50mm O.D x 44mm I.D x 450mm L) with
vacuum sealed flanges.
- Optioanl: you may choose dual zone tube furnace at Pic below
right at extra cost to creat higher thermal gradient or longer constant
temperature zone
-- two zone furnace
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- 2" quick clamp flange with 1/4'' fittings, vacuum gauge
as well as needle valve on the right side
- The right flange is connected to a stainless steel bellow which
is stretchable up to 150 mm.
- Left flange with quick-clamped KF25 vacuum port and 1/4'' barb
venting valve
- Max. Vacuum level: 10E-2 torr by mechanical pump and 10-E5 by
turbopump
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Internal Traveling
Mechanism
&
PLC Control Pannel
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Max. Heating & Cooling Rate
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The max heating and cooling
rate can be achieved by moving sample into pre-heated hot zone and move the
sample out from hot zone. The typical ramp/cool rate is listed in
below:
Heating
Rate:
10°C/sec (150°C -
250°C);
7°C/sec (250°C -
350°C);
4°C/sec (350°C -
500°C);
3°C/sec (500°C -
550°C);
2°C/sec (550°C -
650°C);
1°C/sec (650°C - 800°C);
0.5°C/sec (800°C - 1000°C);
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Cooling Rate:
10°C/sec (950°C - 900°C);
7°C/sec (900°C - 850°C);
4°C/sec (850°C - 750°C);
2°C/sec (750°C - 600°C);
1.5°C/sec (600°C - 500°C);
1°C/sec (500°C - 400°C);
0.5°C/sec (400°C - 300°C);
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- You may need a right angle valve & bellows to connect
a vacuum pump ( click the 1st & 2nd pics to order )
- Anti-Corrosive digital Gauge up to 10E-5 torr is optional
for CVD application (Pic 3)
- You may order multi-channel gas delivery system for DVD or CVD
operation ( Pic 4)
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Two years limited warranty
with lifetime support (Consumable parts such as tubes and o-rings are
not covered by the warranty)
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Laptop, software & WiFi
Control(Optional)
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- Brand new laptop with Microsoft Window 10 and Microsoft Office 2013
(30 days free trial) for immediate use.
- Labview Based Temperature Control System) enables user to edit
temperature profile, manage heat-treatment recipe, record and plot data
for MTI furnaces.
- A wireless remote control provides up to 300 meters operating
range.
- Above features are available upon request at an extra cost (up to
$1,000). Please contact us for more information.
- Note: The software is only
compatible with MTI’s Yudian Temperature Controller
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- CE Certified
- All electric components ( >24V) are UL / MET /
CSA certified
- The furnace is ready to pass
TUV(UL61010) or CSA certification at extra cost. （ please
  
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Warning
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- Tube furnaces with quartz tubes are designed for using under vacuum
and low pressure < 0.2 bars / 3 psi / 0.02 MPa
- Attention: A two-stage pressure regulator must be
installed on the gas cylinder to limit the pressure to below 3 PSI for
safe operation.
- Vacuum limit definition for all quartz tube furnaces: * Vacuum
pressures may only be safely used up to 1000°C
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This multi-functional
furnace is suitable for the applications in below:
- RTE: Crucible loaded with evaporation
material is placed in the center of the furnace, move sample holder
to a downstream position with appropriate temperature where the
deposition takes place.
- HPCVD： Similar setup as
RTE, we also introduce reactant gas to mix with evaporation vapor and
make deposition
- Horizontal Bridgman Crystal Growth： Load material and seed into a crucible and place it in
the center of the furnace. Move the crucible at the desired speed to
grow single crystal under suitable thermal gradient.
- If you have any question and suggestion, please
contact us before purchasing
- After CVD, the graphene must be transferred from the metal catalyst
to another substrate for most applications. By using the
graphene transfer tape, the residue can be low
- For Horizontal directional crystalization (HDC),
you may use a gas feedtrough as pic below
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